发明名称 VACUUM FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a vacuum film deposition system where useless evaporation particles can be shielded and catched by an easily attachable/detachable, relatively compact shielding body. SOLUTION: Regarding the vacuum deposition system 1 where a workpiece W and an evaporation material source 4 are arranged so as to be confronted un and down in a vacuum chamber 2, the system is provided with a cylindrical shielding body 5 surrounding the evaporation material source 4, and further regulating the diffusion range of an evaporation flow A from the evaporation material source 4 in the opening part of the upper end so as to correspond to the size of the workpiece W. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008081768(A) 申请公布日期 2008.04.10
申请号 JP20060261307 申请日期 2006.09.26
申请人 SEIKO EPSON CORP 发明人 TAGUCHI HIROSHI
分类号 C23C14/00;C23C14/24 主分类号 C23C14/00
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