| 摘要 |
The present invention relates to a maskless exposure apparatus and a method of manufacturing a substrate for a display using the same. In the present invention, a substrate 22 is disposed on a scan stage 20 that can be moved in horizontal and vertical directions. Meanwhile, an optical unit 30 for generating light available for exposure is disposed above the substrate 22 . Light that has passed though the optical unit 30 is transferred to a DMD unit 40 . The DMD unit 40 is provided with DMDs 42 for selectively reflecting the light to form a pattern on the substrate 22 . The DMDs 42 are arranged in a plurality of rows in such a manner that DMDs 42 in the same row are spaced apart by a predetermined distance from each other and DMDs 42 in different rows partially overlap with each other at one end portions thereof. Thus, when the DMDs 42 scan the substrate 22 , scan marks 62 are produced discontinuously in two straight lines. According to the present invention constructed as above, the scan marks are produced discontinuously on the substrate during exposure of the substrate, so that a user cannot recognize the presence of the scan marks when watching a display.
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