发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 A substrate treatment apparatus is provided to prevent the damage of the apparatus by preventing abnormal operations caused by non-authorized users. A substrate treatment apparatus includes a display unit(20) and a controller(12). The display unit displays an editing screen for editing a recipe. The controller processes log out, converts the editing screen into another screen when a predetermined time elapses without manipulation on the editing screen and controls to delete the edited data until the log out. The controller controls the conversion from the editing screen to an initial screen and an authorization screen. The initial screen includes a selection menu for processing the change of authorization and log in. The controller allows the edition of the recipe when the process is executed through the selection menu.
申请公布号 KR20080031624(A) 申请公布日期 2008.04.10
申请号 KR20070098631 申请日期 2007.10.01
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 NOGAMI SHIGEKI;FUNAGURA MITSURU;TERANISHI ISAO;YASHIMA TSUKASA;EKKO HIROSHI
分类号 G05B19/418 主分类号 G05B19/418
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