发明名称 FABRICATING METHOD OF SEMICONDUCTOR LIGHT ELEMENT
摘要 PROBLEM TO BE SOLVED: To make a deflection of a semiconductor small in the method of fabricating a semiconductor light element, which contains a semiconductor laser and an EA modulator, on substrate. SOLUTION: In advance of growth of an active layer 27 for an EA modulator, at least part of deposition, namely an abnormal growth portion 25 formed at the growth of the first optical confinement layer 23, on an etching edge face 19a of a first semiconductor portion 19 is removed by etching. In this way, bend of the active layer 27 for the EA modulator caused by the abnormal growth portion 25 can be made small. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008085180(A) 申请公布日期 2008.04.10
申请号 JP20060265327 申请日期 2006.09.28
申请人 SUMITOMO ELECTRIC IND LTD 发明人 KATSUYAMA TOMOKAZU
分类号 H01S5/50;G02F1/017 主分类号 H01S5/50
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