发明名称 CATALYST-AIDED CHEMICAL PROCESSING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a catalyst-aided chemical processing method, by which hard-to-process materials, especially SiC, GaN, or the like, whose importance as electronic device materials increases these days, can be processed with high processing efficiency and high precision even for a space wavelength range of not less than several tens ofμm. SOLUTION: The catalyst-aided chemical processing method comprises: putting a workpiece 28 such as GaN or SiC in a processing liquid 22 in which halogen-containing molecules such as hydrofluoric acid or the like are dissolved; and moving the workpiece 28 and a catalyst 26 composed of molybdenum or a molybdenum compound relative to each other while bringing the catalyst 26 into contact with or close proximity to the surface to be processed of the workpiece 28, thereby processing the surface to be processed of the workpiece 28. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008081389(A) 申请公布日期 2008.04.10
申请号 JP20060328331 申请日期 2006.12.05
申请人 OSAKA UNIV;EBARA CORP 发明人 YAMAUCHI KAZUTO;SANO YASUHISA;HARA HIDEYUKI;MURATA JUNJI;YAGI KEITA
分类号 C30B33/00;B01J23/28;B24B1/00;H01L21/304 主分类号 C30B33/00
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