| 摘要 |
PURPOSE: A plasma processing apparatus is provided to be capable of preventing foreign substance from being attached at a dielectric part between a high frequency antenna and a plasma generating part. CONSTITUTION: A plasma processing apparatus(100) is provided with a high frequency antenna(112), a high frequency supply voltage source(160) connected to the high frequency antenna, and a susceptor(106) for loading a process object body. The plasma processing apparatus further includes a dielectric part(120) between the high frequency antenna and the susceptor, a conductive part(170) between the high frequency antenna and the dielectric part, a ground circuit(180) connected to the conductive part, and an inductor(302) installed at the ground circuit. |
