| 摘要 |
<p>A temperature measuring apparatus, a temperature measuring method, and a thermal treatment apparatus which are suitable for temperature measurement of a substrate subjected to a rapid heating in thermal treatment are provided. The temperature measuring apparatus includes a light intensity measuring unit, a calculation unit, and a temperature output unit. In the light intensity measuring unit, an object to be heated having a uniquely defined correlation between temperature and refractive index is irradiated with a probe laser beam, and a light intensity property X is determined which represents a relationship between time and light intensity of a reflected light or a transmitted light occurring as a result of interference of the multiply-reflected probe laser beam within the object to be heated. In the calculation unit, which is for acquisition of a replicated object to be heated, a virtual object to be heated having equivalent dimensional, thermal, and optical characteristics to those of the object to be heated is subjected to a thermal incidence equivalent to the heating conditions of the object to be heated, a light intensity property of the virtual object to be heated being irradiated with a probe laser beam having an equivalent property to the above-mentioned probe laser beam is acquired, and a virtual object to be heated having a light intensity property Z, which is closest to the light intensity property X, is obtained as a replicated object to be heated. The temperature output unit acquires temperature of the object to be heated at a predetermined position thereon at a predetermined time on the basis of the replicated object to be heated.</p> |
