| 发明名称 |
EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE |
| 摘要 |
An exposure apparatus (EX) is provided with a first stage (WST) and a second stage (MST). A maintenance apparatus (55) carries out maintenance on the second stage (MST) during exposure processing of a wafer (W) held on the first stage.
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| 申请公布号 |
EP1909310(A1) |
申请公布日期 |
2008.04.09 |
| 申请号 |
EP20060768071 |
申请日期 |
2006.07.11 |
| 申请人 |
NIKON CORPORATION |
发明人 |
MIZUTANI, TAKEYUKI;OKUMURA, MASAHIKO;KOHNO, HIROTAKA |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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