发明名称 |
METHOD AND SYSTEM FOR NON-DESTRUCTIVE DISTRIBUTION PROFILING OF AN ELEMENT IN A FILM |
摘要 |
<p>A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.</p> |
申请公布号 |
EP1907936(A2) |
申请公布日期 |
2008.04.09 |
申请号 |
EP20060773884 |
申请日期 |
2006.06.23 |
申请人 |
REVERA INCORPORATED |
发明人 |
DECECCO, PAOLA;SCHUELER, BRUNO;REED, DAVID;KWAN, MICHAEL;BALLANCE, DAVID, S. |
分类号 |
G01J3/45 |
主分类号 |
G01J3/45 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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