| 摘要 |
Provided are a high purity Ni-V alloy, high purity Ni-V alloy target and high purity Ni-V alloy thin film wherein the purity of the Ni-V alloy excluding Ni, V and gas components is 99.9wt% or higher, and the V content variation among ingots, targets or thin films is within 0.4%. With these high purity Ni-V alloy, high purity Ni-V alloy target and high purity Ni-V alloy thin film having a purity of 99.9wt% or higher, the variation among ingots, targets or thin films is small, the etching property is improved, and isotopic elements such as U and Th that emit alpha particles having an adverse effect on microcircuits in a semiconductor device are reduced rigorously. And further provided is a manufacturing method of such high purity Ni-V alloy capable of effectively reducing the foregoing impurities. |
