| 摘要 |
<p>A chemical supply apparatus is provided to eliminate the necessity of an additional pumping apparatus by installing a chemical storage bath in the upper part of a nozzle. A discharge hole for discharging chemical to the surface of a substrate(G) is formed in a nozzle(1). A chemical supply part(3) supplies chemical to the nozzle, installed in the upper part of the nozzle and capable of transferring vertically. The quantity of the discharged chemical is adjusted by the height of the chemical supply part and the nozzle. The chemical supply part can include a chemical storage bath, a chemical guide pipe, a first valve and a height adjustment unit(7). The chemical storage bath supplies the chemical to the nozzle. The chemical guide pipe guides the chemical to the nozzle wherein one end of the chemical guide pipe is connected to the chemical storage bath and the other end of the chemical guide pipe is connected to the nozzle. The first valve selectively opens and closes the chemical guide pipe, installed on the chemical guide pipe. The height adjustment unit adjusts the height of the chemical storage bath, installed at one side of the chemical storage bath.</p> |
