发明名称 COMPLEX OXIDE FILM AND METHOD FOR PRODUCING SAME, DIELECTRIC MATERIAL INCLUDING COMPLEX OXIDE FILM, PIEZOELECTRIC MATERIAL, CAPACITOR, PIEZOELECTRIC ELEMENT, AND ELECTRONIC DEVICE
摘要 <p>Disclosed is a complex oxide film having a high relative dielectric constant wherein carbonates are reduced by forming the complex oxide film on the surface of a base by wet processing and cleaning the thus-formed complex oxide film with an acidic solution having a pH of not more than 5. Also disclosed is a method for producing such a complex oxide film. Also disclosed are a dielectric material and piezoelectric material including such a complex oxide film, a capacitor element and a piezoelectric element containing such a material, and an electronic device comprising such an element.</p>
申请公布号 KR20080031267(A) 申请公布日期 2008.04.08
申请号 KR20087000681 申请日期 2008.01.10
申请人 SHOWA DENKO KABUSHIKI KAISHA 发明人 SHIRAKAWA AKIHIKO;FUKUNAGA HIROFUMI;YU CHUNFU
分类号 C01G1/02;C01G23/00;C23C22/64;C23C28/00;C25D11/26;H01B3/00;H01G4/33;H01L41/187;H01L41/317;H01L41/39 主分类号 C01G1/02
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