发明名称 COMPOUND OXIDE FILM AND METHOD FOR MANUFACTURING SAME, AND DIELECTRIC MATERIAL, PIEZOELECTRIC MATERIAL, CAPACITOR, PIEZOELECTRIC ELEMENT AND ELECTRONIC DEVICE WHICH INCLUDE COMPOUND OXIDE FILM
摘要 A compound oxide film having high crystallinity is provided by forming a compound oxide film on the surface of a base body and baking the compound oxide film in an atmosphere gas having an oxygen partial pressure of 1x10^-3Pa or less at a temperature of 400°C or higher. A method for manufacturing such compound oxide film is also provided. Furthermore, a dielectric material and piezoelectric material including such compound oxide film, a capacitor and a piezoelectric element including such material, and an electronic device including such elements are provided.
申请公布号 KR20080031268(A) 申请公布日期 2008.04.08
申请号 KR20087000682 申请日期 2008.01.10
申请人 SHOWA DENKO KABUSHIKI KAISHA 发明人 SHIRAKAWA AKIHIKO;KAWASAKI TOSHIYA;FUKUNAGA HIROFUMI
分类号 C01G23/00;H01G4/33;H01L41/187;H01L41/22;H01L41/24;H01L41/317 主分类号 C01G23/00
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