发明名称 |
Gas flow control system with interlock |
摘要 |
A system for controlling the flow of gases into a reaction chamber used in processing semiconductor devices includes a safety interlock feature that prevents inadvertent mixing of incompatible, reactive gases. The interlock feature is implemented in an interlock control circuit which operates a valve system for individually controlling the flow of separate gases into the chamber. The interlock circuit includes a series of relay switches and timers arranged to create a time delay between the initiation of flow of gases from separate sources into the chamber.
|
申请公布号 |
US7354555(B2) |
申请公布日期 |
2008.04.08 |
申请号 |
US20020141566 |
申请日期 |
2002.05.08 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
YEN CHIH-PEN;TSAY JENG-YANN;CHUANG JENG-CHIANG;LIN CHENG-FANG;HSU YUNG-MAO |
分类号 |
B32B5/02;B32B27/04;G05D7/06 |
主分类号 |
B32B5/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|