发明名称 Gas flow control system with interlock
摘要 A system for controlling the flow of gases into a reaction chamber used in processing semiconductor devices includes a safety interlock feature that prevents inadvertent mixing of incompatible, reactive gases. The interlock feature is implemented in an interlock control circuit which operates a valve system for individually controlling the flow of separate gases into the chamber. The interlock circuit includes a series of relay switches and timers arranged to create a time delay between the initiation of flow of gases from separate sources into the chamber.
申请公布号 US7354555(B2) 申请公布日期 2008.04.08
申请号 US20020141566 申请日期 2002.05.08
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 YEN CHIH-PEN;TSAY JENG-YANN;CHUANG JENG-CHIANG;LIN CHENG-FANG;HSU YUNG-MAO
分类号 B32B5/02;B32B27/04;G05D7/06 主分类号 B32B5/02
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