发明名称 Multi-channel transistor structure and method of making thereof
摘要 A method of forming an electronic device includes, forming a first channel coupled to a first current electrode and a second current electrode and forming a second channel coupled to the first current electrode and the second current electrode. The method also includes the second channel being substantially parallel to the first channel within a first plane, wherein the first plane is parallel to a major surface of a substrate over which the first channel lies. A gate electrode is formed surrounding the first channel and the second channel in a second plane, wherein the second plane is perpendicular to the major surface of the substrate. The resulting semiconductor device has a plurality of locations with a plurality of channels at each location. At small dimensions the channels form quantum wires connecting the source and drain.
申请公布号 US7354831(B2) 申请公布日期 2008.04.08
申请号 US20050199482 申请日期 2005.08.08
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 ORLOWSKI MARIUS K.
分类号 H01L21/336;H01L21/00;H01L21/84;H01L27/01;H01L27/12;H01L31/0392 主分类号 H01L21/336
代理机构 代理人
主权项
地址
您可能感兴趣的专利