发明名称 Silicon on diamond-like carbon devices
摘要 Embodiments of the invention provide substrate with an insulator layer on the substrate. The insulator layer may include diamond-like carbon. A device, such a tri-gate transistor may be formed on the diamond-like carbon layer.
申请公布号 US7355247(B2) 申请公布日期 2008.04.08
申请号 US20050072347 申请日期 2005.03.03
申请人 INTEL CORPORATION 发明人 SHAHEEN MOHAMAD A.;RAVI KRAMADHATI V.
分类号 H01L27/01;H01L27/12;H01L31/0392 主分类号 H01L27/01
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