APPARATUS AND METHOD FOR CLEANING SUBSTRATES

摘要

A substrate cleaning apparatus and a substrate cleaning method using the same are provided to supply a dry fluid onto a substrate by arranging a fluid supply member near to an upper part of a substrate. A substrate cleaning apparatus includes a substrate supporting member(100) and a fluid supply member(300). A substrate is loaded on the substrate supporting member having a rotating function. The fluid supply member has a shape corresponding to the substrate loaded on the substrate supporting member. The fluid supply member is arranged above an upper surface of the substrate in order to supply a rinsing solution and a dry fluid onto the substrate. The substrate cleaning apparatus includes a lifting unit(360) for moving the fluid supply member to a position near to an upper part of the substrate when the rinsing solution and the dry fluid are supplied onto the substrate.