| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To suppress the rise of product cost while not increasing the number of manufacturing processes, and protect a wiring layer from an electrostatic discharge failure by the charge accumulated during the manufacturing process. <P>SOLUTION: An electro-optical device includes: a signal line layer 200 in a peripheral region provided in the periphery of a pixel region on a TFT substrate 10; a wiring layer 201 disposed above the signal line layer 200 in the direction intersecting with the signal line layer 200; and a shield layer 203 placed between the signal line layer 200 and the wiring layer 201 through insulation layers 41' and 42' in the region where at least the signal line layer 200 and the wiring layer 201 intersect with each other in the planar view. The shield layer 203 is the same layer as the layer of the lower electrode 71 of a storage capacitor 70 formed in the pixel region, and is formed when the patterning of the lower electrode 71 is performed simultaneously. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
