发明名称 Design Structure for a Metal Fill Region of a Semiconductor Chip
摘要 A design structure embodied in a machine readable medium used in a design process includes a metal fill region of a semiconductor chip including a plurality of layer sets of the semiconductor chip, each set including a first metal fill layer, a second metal fill layer, and an insulation layer included disposed in planes parallel to each other, a plurality of metal fill pieces disposed in each of the metal fill layers, a metal fill piece axis of each of the pieces, wherein each of the axes perpendicularly intersects the planes of said metal fill layers and the insulation layer from any point of reference, and a metal fill pattern configured to position the pieces so that the axis of each piece in the first metal fill layer is linearly displaced of the axis of each piece in the second metal fill layer in at least one direction orthogonal to each of the metal fill axes.
申请公布号 US2008082300(A1) 申请公布日期 2008.04.03
申请号 US20070868558 申请日期 2007.10.08
申请人 发明人 BAUMGARTNER STEVEN J.;LI CHUN-TAO;STORINO SALVATORE N.;WONG MANKIT
分类号 G06F17/50 主分类号 G06F17/50
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