RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING THE SAME,申请号WO2007NL50466-传众专利搜索

发明名称	RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING THE SAME
摘要	<p>An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.</p>
申请公布号	WO2008039068(A2)	申请公布日期	2008.04.03
申请号	WO2007NL50466	申请日期	2007.09.25
申请人	ASML NETHERLANDS B.V.;KONINKLIJKE PHILIPS ELECTRONICS N.V.;VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS;BANINE, VADIM YEVGENYEVICH;FRANKEN, JOHANNES CHRISTIAAN LEONARDUS;FRIJNS, OLAV WALDEMAR VLADIMIR;KLUNDER, DERK JAN WILFRED;DRIESSEN, NIELS MACHIEL;SOER, WOUTER ANTHON	发明人	VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS;BANINE, VADIM YEVGENYEVICH;FRANKEN, JOHANNES CHRISTIAAN LEONARDUS;FRIJNS, OLAV WALDEMAR VLADIMIR;KLUNDER, DERK JAN WILFRED;DRIESSEN, NIELS MACHIEL;SOER, WOUTER ANTHON
分类号	G03F7/20	主分类号	G03F7/20
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