发明名称 SEMICONDUCTOR PHOTODETECTOR AND MANUFACTURING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor photodetector, having a light-receiving layer which provides a wide detecting sensitivity in the long-wavelength zone and suppresses dark current by reducing defect density, and to provide its manufacturing method. <P>SOLUTION: The semiconductor photodetector is provided with an InP substrate 11, an In<SB>x</SB>Ga<SB>1-x</SB>As buffer layer 12 (0&le;x&le;1) and a light-receiving layer 13 which is positioned on the In<SB>x</SB>Ga<SB>1-x</SB>As buffer layer 12 and contains nitrogen. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008078261(A) 申请公布日期 2008.04.03
申请号 JP20060253839 申请日期 2006.09.20
申请人 SUMITOMO ELECTRIC IND LTD 发明人 MIURA KOHEI;MITSUI NOBUYUKI;INADA HIROSHI;NAGAI YOICHI;INOGUCHI YASUHIRO
分类号 H01L31/10 主分类号 H01L31/10
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