发明名称 EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD OF MANUFACTURING PANEL SUBSTRATE FOR DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To finely adjust quantity of light of exposure light by increasing an operation speed of a shutter. <P>SOLUTION: A shutter that blocks exposure light has a plurality of rotor plates 35a, 35b and allows the exposure light passing through a gap produced by rotation of the rotor plates to expose a substrate. Since the rotor plate 35a, 35b, unlike a shutter plate of a conventional rotary shutter mechanism, has a rotation axis R in a direction crossing the propagation direction of the exposure light and has a width W in a direction perpendicular to the rotation axis R, smaller than the optical path diameter of the exposure light, rotation of the shutter can be rapidly started and stopped. The operation speed of the shutter is therefore increased to reduce an open time of the shutter, and the quantity of light of the exposure light is finely adjusted. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008076924(A) 申请公布日期 2008.04.03
申请号 JP20060258382 申请日期 2006.09.25
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TAKAHASHI SATOSHI;NAKANO KAZUYUKI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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