发明名称 SUBSTRATE INSPECTION DEVICE AND ITS INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate inspection device and its inspection method of high detection accuracy on flaw or foreign matter. SOLUTION: In this inspection device inspecting one surface of a translucent substrate as an inspecting surface, only the nearest zone to a lighting means among a plurality of zones is imaged from a side facing an inspecting surface, by holding a surface of the substrate on the opposite side of the inspection surface and lighting the inspection surface from above a plane including the inspection surface or from the outside of the normal of the inspection surface than the plane including the inspecting surface. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008076138(A) 申请公布日期 2008.04.03
申请号 JP20060253876 申请日期 2006.09.20
申请人 SEIKO EPSON CORP 发明人 MATSUSHIMA SEIICHI
分类号 G01N21/956;G01N21/958;G02F1/13 主分类号 G01N21/956
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