| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a novel thin film formed on a substrate board, a light-emitting element and a thin film. SOLUTION: The thin film is formed on the substrate board. The thin film contains added elements in a base material. The base material preferably comprises SiO<SB>2</SB>as an ingredient. The added element is preferably Ge or Si or a combination of Si and Ge. As a method for producing the thin film, a high frequency wave magnetron sputtering method can be adopted, wherein a chip 3 is placed on a target 2 and electric voltage is applied to a space between the target 2 and the substrate board 1 to form the thin film on the substrate board 1. The substrate board 1 on which the thin film is formed can be used as a constituent ingredient of a light-emitting element. COPYRIGHT: (C)2008,JPO&INPIT
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