| 摘要 |
A plasma processing system and plasma monitor therefor are provided in which a plasma monitor housing is coupled to a plasma processing chamber such that a line-of-sight monitoring path extends through the housing to an optical sensor outside of a window. A separate reference signal path extends through the housing from a reference light source on one side of the housing to a reference optical sensor on the other side of the housing. The housing is configured so that deposits from the chamber affect all of the windows equally, and to retard the flow of contaminating film forming material onto the windows, using, for example, baffles, gas counterflow, and a balanced radial-leg housing. A processor uses the reference signal to determine window contamination and compensate for signal attenuation along the monitoring path caused by window coating, in the making of a measurement of plasma emissions. The measurement can be used by the processing system to control the plasma.
|
