| 摘要 |
A method of determining preventive maintenance for an optical inspection system for inspecting photolithography processed substrates. The method includes measuring at least one operational characteristic of the optical inspection system and comparing a measurement result for said at least one operational characteristic with predetermined preventive maintenance criteria for the operational characteristic. Also included is determining a preventive maintenance requirement based on a comparison result of said comparing, and initiating a preventive maintenance action on said optical inspection system, said preventive maintenance action corresponding to said preventive maintenance requirement. A method of automatically performing preventive maintenance on an optical inspection system, and for retrofitting an optical inspection system to facilitate preventive maintenance of the optical inspection system are also disclosed.
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