| 摘要 |
PROBLEM TO BE SOLVED: To prevent a non-uniformly rubbed region from occurring in a raw material being a processing target by rotating a backup roll at a predetermined speed. SOLUTION: This emboss processing apparatus is constituted so as to hold the raw material 70 composed of a paper layer 72 and a synthetic resin layer 71 to apply emboss processing to the surface of the synthetic resin layer 71 and equipped with the embossing roll 50 installed on the side of the synthetic resin layer 71 of the raw material 70 to apply an embossed pattern to the synthetic resin layer 71, the backup roll 40 installed on the side of the paper layer 72 of the raw material 70 to grasp the raw material 70 with respect to the embossing roll 50, the drive mechanism installed on the embossing roll 50 to rotationally drive the embossing roll 50 and a transmission mechanism provided between the embossing roll 50 and the backup roll 40 to transmit the driving force applied to the embossing roll 50 from the drive mechanism to the backup roll 40. A brake mechanism for always braking the backup roll 40 is installed on the backup roll 40. COPYRIGHT: (C)2008,JPO&INPIT |
