发明名称 HOLOGRAM SUBSTRATE, METHOD FOR MANUFACTURING HOLOGRAM SUBSTRATE, AND IMAGE PROJECTOR
摘要 PROBLEM TO BE SOLVED: To provide a hologram substrate in which an irradiating laser beam can be efficiently used for projecting a reproduced image, and to provide a method for manufacturing a hologram substrate for efficiently manufacturing the above hologram substrate, and an image projector. SOLUTION: The hologram substrate 1 functions to form an image by irradiation with a laser beam and has a hologram pattern 11 that is formed on an opposite face to the face to be irradiated with a laser beam and diffracts the laser beam to project an image of an optional shape, and a great number of minute protrusions and recesses 12 formed on the face to be irradiated with a laser beam. The average pitch of adjacent protrusions in the protrusions and recesses 12, the width of the protrusions and recesses 12, and a height difference of the protrusions and recesses are 30 to 50% of the wavelength of the laser beam. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008076571(A) 申请公布日期 2008.04.03
申请号 JP20060253525 申请日期 2006.09.19
申请人 SEIKO EPSON CORP 发明人 SORIMACHI HIDEMITSU;MIYAO NOBUYUKI
分类号 G03H1/18;G03B21/00;G03H1/22 主分类号 G03H1/18
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