发明名称 HIGH PRESSURE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To enhance the efficiency of surface treatment by improving the replaceability of a high pressure fluid in the vicinity of the surface of a material to be treated and to enhance the degree of cleaning by evading generation of a dead space in a treating chamber. SOLUTION: A partitioning plate 4 forms an upper stream chamber 12 and a lower stream chamber 13 by partitioning the treating chamber 11 to the upper side and the lower side. A substrate W is placed to the lower chamber 13 at a stationary state by feeding SCCO<SB>2</SB>to the upper stream chamber 12 from a pressure fluid feed part 2. The partitioning plate 4 is provided with a penetrating opening 41. A rotation driving part 5 rotates the partitioning plate 4 through a driving shaft 6 attached to the partitioning plate 4. When the partitioning plate 4 rotates through one rotation, a locus drawn by the lower side opening of the penetrating opening 41 covers the whole surface of the substrate W. Thereby, SCCO<SB>2</SB>is sprayed over the whole surface of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008073611(A) 申请公布日期 2008.04.03
申请号 JP20060255315 申请日期 2006.09.21
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SAITO KIMITSUGU
分类号 B08B7/00;H01L21/304 主分类号 B08B7/00
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