VARIABLE PATH INTERCONNECTION CELL, SEMICONDUCTOR INTEGRATED CIRCUIT AND ITS DESIGN METHOD, AND METHOD FOR FORMATION OF VARIABLE PATH INTERCONNECTION CELL

摘要

PROBLEM TO BE SOLVED: To prevent increase of the number of mask correction processes and a mask cost required for the correction when a mask is changed for correction of a semiconductor integrated circuit. SOLUTION: A variable path interconnection cell C has first and second two inner existence interconnections e1, e2 existing inside alone and first and second two external extension interconnections E1, E2 whose external extension parts are terminals I1, I2. It has a first interconnection layer wherein the first and second inner existence interconnections e1, e2 can be selectively connected to the first and second external extension interconnections E1, E2, respectively, a second interconnection layer which has the same or similar pattern as the first interconnection layer, and is disposed opposite to the first interconnection layer whose directionality is different from that of the first interconnection layer, and an interlayer contact layer which selectively connects the first and second inner existence interconnections e1, e2 in the first interconnection layer to first and second inner existence interconnections f1, f2 in the second interconnection layer. COPYRIGHT: (C)2008,JPO&INPIT