发明名称 METHOD FOR MANUFACTURING ORGANIC MATERIAL APPARATUS
摘要 <p>This invention provides a method for manufacturing an organic material apparatus, comprising a step of forming a sacrifice layer formed of an inorganic material on a first material layer formed of an organic material provided on a substrate, a step of forming a resist in the area on the substrate including the top of the sacrifice layer, a selective exposure step of for selectively exposing the resist to form a predetermined pattern, a development step of dissolving, with a developing solution comprising an aqueous solution which can dissolve the sacrifice layer, the resist part exposed in the selective exposure step and the sacrifice layer provided just under the resist part, and a step of forming the second material layer on the substrate after the development step, and a lift-off step of dissolving, with a developing solution comprising an aqueous solution which can dissolve the sacrifice layer, the resist and the sacrifice layer just under the resist to lift off the second material layer on the resist to pattern the second material layer.</p>
申请公布号 WO2008038588(A1) 申请公布日期 2008.04.03
申请号 WO2007JP68393 申请日期 2007.09.21
申请人 ROHM CO., LTD.;SUGANUMA, NAOTOSHI;SHIMOJI, NORIYUKI;OKU, YOSHIAKI 发明人 SUGANUMA, NAOTOSHI;SHIMOJI, NORIYUKI;OKU, YOSHIAKI
分类号 H01L21/336;H01L21/027;H01L21/28;H01L21/306;H01L27/28;H01L29/786;H01L51/05;H01L51/40;H01L51/50 主分类号 H01L21/336
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