| 摘要 |
<p>An article processing apparatus is provided to improve manufacturing throughput by transmitting a signal from an exposure device to an application/developing device earlier than normal. An exposure apparatus(100) includes a lighting unit(1), a reticle stage(3), and a reticle position measuring unit(4). The lighting unit includes an optical source. The reticle stage contains a reticle, on which a pattern is formed. The reticle position measuring unit measures a position of the reticle contained on the reticle stage. The exposure apparatus includes a projection optical system(5) and a stage unit(20), which determines a position of a substrate(9), on which a photo-sensitive material is applied. The stage unit includes an XY stage(6) and a Z stage(8). The exposure apparatus includes a laser interferometer(7) and a focusing unit(10), which measures a Z directional position of the substrate.</p> |
