| 摘要 |
A method for handling a polysilazane or polysilazane solution is provided to produce the impurity-free polysilazane or polysilazane solution capable of forming insulating films or low-k films comprising micropores and having good characteristics. A method for handling a polysilazane or polysilazane solution includes a step of synthesizing a polysilazane and handling a polysilazane solution or polysilazane comprising a combination of the polysilazane solution within a first space that is shielded from external air and contains air as an air source. The air is free of amine, basic materials, volatile organic compounds, and acidic materials. The air free of amine, basic materials, volatile organic compounds, and acidic materials is formed by passing external air through an adsorbent that absorbs amine, basic materials, volatile organic compounds, and acidic materials.
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