发明名称 SEMICONDUCTOR DEVICE
摘要 There is a problem that a reverse off-leak current becomes too large in a Schottky barrier diode. A semiconductor device of the present invention includes a P-type first anode diffusion layer formed in an N-type epitaxial layer, a second anode diffusion layer which is formed so as to surround the first anode diffusion layer, and which has an impurity concentration lower than that of the first anode diffusion layer, N-type cathode diffusion layers formed in the epitaxial layer, and a Schottky barrier metal layer formed on the first and second anode diffusion layers.
申请公布号 US2008079110(A1) 申请公布日期 2008.04.03
申请号 US20070862365 申请日期 2007.09.27
申请人 SANYO SEMICONDUCTOR CO., LTD. 发明人 KIKUCHI SHUICHI;OKAWA SHIGEAKI;NAKAYA KIYOFUMI;TANAKA SHUJI
分类号 H01L27/08 主分类号 H01L27/08
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