发明名称 |
NEAR-FIELD EXPOSURE MASK, NEAR-FIELD EXPOSURE APPARATUS, AND NEAR-FIELD EXPOSURE METHOD |
摘要 |
A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.
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申请公布号 |
US2008079926(A1) |
申请公布日期 |
2008.04.03 |
申请号 |
US20070864097 |
申请日期 |
2007.09.28 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
ITO TOSHIKI;MIZUTANI NATSUHIKO |
分类号 |
G03F1/00;G03B27/58;G03B27/60 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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