| 摘要 |
A method and an apparatus for removing a high-melting point additive for producing a film with low retardation are provided, and a method and an apparatus for recovering a solvent using the method and the apparatus for removing the high-melting point additive are provided. An apparatus for removing a high-melting point compound comprises a contacting equipment for contacting a high-melting point compound with a cleaning liquid having a temperature that is lower than a melting point(MP1) of the high-melting point compound and higher than a melting point(MP2) of a low-melting point compound in a gas in which compounds having different melting points are mixed. The apparatus for removing a high-melting point compound further comprises a mixing equipment for producing the gas containing the low-melting point compound in a mixing ratio range of 30 to 50 wt.%. The apparatus for removing a high-melting point compound further comprises: a gas recovering equipment for recovering after-drying air containing the high-melting point compound and the solvent, the after-drying air being generated by drying a wet film comprising a polymer as a raw material of the film, a solvent which dissolves the polymer, and the high-melting point compound; a mixing equipment for mixing air comprising the low-melting point compound with the after-drying air to produce the gas; and a cooling equipment for cooling the after-drying air or the gas to precipitate the high-melting point compound. Further, the cleaning liquid is water.
|
