| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition conforming to a request of forming a finer pattern, improving resolution and solving problems such as edge roughness, and to provide a pattern forming method using the composition. <P>SOLUTION: The photosensitive composition contains a compound having a truxene skeleton expressed by general formula (I) and a photoacid generator that generates an acid by the effect of UV rays or ionization radiation. In formula (I), each of X and R represents a monovalent organic group selected from a group composed of hydrogen, substituted or unsubstituted alkyl groups, substituted or unsubstituted alkoxy groups and substituted or unsubstituted aromatic groups, and X and R can be identical or different from each other; and each of l, m, n represents an integer of 1 to 4. <P>COPYRIGHT: (C)2008,JPO&INPIT |
