发明名称 LITHOGRAPHIC APPARATUS HAVING MECHANISM PROVIDING GAS BEARING, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus whose movable object component can be guided with a gas bearing, to which pressurized gas is supplied by using an improved gas supply mechanism. <P>SOLUTION: The lithographic apparatus which has a track prepared with a plurality of gas flow ejection holes arranged along the track is disclosed. Gas conduits are constituted so that they supply the pressurized gas to the gas flow ejection holes in order to form the gas bearing constituted for supporting the object component movably along the track. Furthermore, a gas flow device is formed that is constituted for generating gas flows which pass through one or more gas flow ejection holes on a guide surface of the object component, or for impeding gas flows which pass through one or more gas flow ejection holes, corresponding to the positional relations between the gas flow ejection holes and positions on the guide surface. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008078643(A) 申请公布日期 2008.04.03
申请号 JP20070225165 申请日期 2007.08.31
申请人 ASML NETHERLANDS BV 发明人 JACOBS HERNES
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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