| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus, which processes substrates by feeding processing liquid to them, capable of restraining the substrates from being charged with electricity during processing. <P>SOLUTION: The substrate processing apparatus 1 is equipped with a discharge means 41, which is provided with discharge openings 46 for discharging droplets of processing liquid, and an inductive electrode unit 44 formed of annular electrode members 44a each disposed near the discharge opening 46. A processing liquid supply pipe 412 is grounded through a conducting wire 49. The inductive electrode unit 44 is connected to a power supply 45, and a potential difference is given between the processing liquid supply pipe 412 and the inductive electrode unit 44, so that charge is induced in the processing liquid around the discharge openings 46. In the substrate processing apparatus 1, the substrate 2 is cleaned with the droplets of processing liquid where charge is induced, so that the substrate 2 can be restrained from being charged with electricity while and after it is cleaned. The inductive electrode unit is composed of two or more electrode members, so that the inductive electrode unit can be disposed in a simple configuration for the discharge means with two or more discharge openings. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
