发明名称 Protective coating for mark preservation
摘要 A polymer coating material is disposed at a surface of a semiconductor substrate, superimposing a readable mark formed thereupon. A perimeter of the coating material is configured to correspond approximately with a perimeter of the mark, and a thickness of the coating material is configured to be relatively conformal with the surface of the substrate. The mark remains readable through the coating material throughout manufacturing, reliability testing, and normal use. A substrate so formed may constitute a portion of an assembly and/or system (e.g., computer system). Throughout manufacturing, reliability testing and normal use, a readable mark provides product identification, traceability, and other benefits.
申请公布号 US2008081407(A1) 申请公布日期 2008.04.03
申请号 US20060529953 申请日期 2006.09.29
申请人 OH MAY LING;SIM LIM CHONG 发明人 OH MAY LING;SIM LIM CHONG
分类号 H01L21/8249 主分类号 H01L21/8249
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