THERMAL TREATMENT DEVICE

摘要

A thermal treatment device is provided to increase uniformity and a throughput and to enhance productivity by minimizing a temperature deviation in a heat treatment process. An external chamber includes a heat treatment space isolated from the outside. A supporting mechanism(200) supports and receives a plate-shaped processing target at a horizontal stance. A hot wind mechanism supplies hot wind to a plurality of blocks which are formed by dividing the supporting mechanism in a vertical direction. The hot wind mechanism processes the plate-shaped processing target by using the hot wind. An internal chamber is installed between the supporting mechanism and the external chamber in order to form a hot wind circulation path. The hot wind mechanism includes a first hot wind mechanism(310) for supplying the hot wind from a center of the vertical direction of the supporting mechanism to an upper block and a second hot wind mechanism(320) for supplying the hot wind from the center of the vertical direction of the supporting mechanism to a lower block.