| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a patterned sapphire substrate. <P>SOLUTION: The manufacturing method includes process wherein first, a sapphire substrate is prepared and a mask layer is formed on the sapphire substrate. Here, the mask layer having a proper pattern exposes part of the sapphire substrate. Next, wet etching processing is carried out, and the exposed part of the sapphire is removed. An etching agent used in the wet etching processing contains sulfuric acid and a mixture of sulfuric acid and phosphoric acid. Next, the mask layer is removed, and a patterned sapphire substrate is formed. Furthermore, a method for manufacturing a light-emitting diode is included. <P>COPYRIGHT: (C)2008,JPO&INPIT |
