METHOD OF PRODUCING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To improve throughput by providing a manufacturing technique for reducing the number of photolithographic steps using a photoresist and simplifying a manufacturing process of a semiconductor device. SOLUTION: An etching mask for forming a pattern of a processing target layer such as a conductive layer and a semiconductor layer is produced without using a lithographic technique employing a photoresist. The etching mask consists of a light-absorbing layer made of a material absorbing a laser beam. The light-absorbing layer is irradiated with a laser beam via the photomask, and a mask is formed while utilizing laser ablation based on the energy of the laser beam absorbed by the light-absorbing layer. COPYRIGHT: (C)2008,JPO&INPIT