| 摘要 |
A technique for improved ion implantation is provided. The technique is embodied as an electrostatic filter for an ion implantation device. The electrostatic filter is located just prior to deceleration and may be integrated with a decelerator. Electrodes are used to generate an electric field to separate neutrals from ions. Also, the filter may include active cooling to reduce background gas pressure, a precursor to neutral particle formation. Electrode geometry may also inhibit high energy neutrals from contaminating the target substrate.
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