MASK SET FOR MICROARRAY, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING MICROARRAY USING MASK SET

摘要

A mask set is provided to have a controlled area of a transparent region. A system and a method for determining a mask layout are provided to control the area of the transparent region of the mask layout to have the same or larger area than minimum transparent region without changing sequences of a probe to be synthesized, thereby improving the pattern reliability of the mask set. A mask set comprises a plurality of masks for in situ synthesizing a probe of a microarray, wherein each of the mask includes a transparent region and a shielding region and the area of the transparent region regarding the total area of the transparent region and the shielding region is more than 5%. A system for determining a mask layout comprises: a pattern determining portion which provides the transparent region and the shielding region to a plurality of mask layouts for in situ synthesizing the probe of the microarray; a selection portion which selects one of the mask layouts; a comparison portion which compares the transparent region area of the selected mask layout with a minimum transparent area; and a pattern changing portion which exchanges the selected shielding region of the selected mask layout with the pattern changing portion of the transparent region of the non-selected mask layout when the transparent region of the selected mask layout is smaller than the minimum transparent region. A method for preparing the microarray comprises the steps of: (a) providing a substrate including a plurality of arrayed probe cells and the surface being protected by a photodegradable protecting group; and (b) in situ synthesizing the probe of the microarray using the mask set, wherein each the transparent region and the shielding region corresponds to the probe cell of the microarray. Further, an area of the probe cells is 100mum or more.