| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a transfer film which can simply and efficiently form a highly defined inorganic pattern and a method of forming an inorganic pattern using the transfer film. <P>SOLUTION: The transfer film is preferably laminated with a resist layer, a phosphor layer and an inorganic pigment layer on a support film in this order. Further, after the laminated film of the transfer film is formed by transferring so as to abut the inorganic pigment layer on a substrate and the resist layer is subjected to exposure processing, a resist pattern is manifested by carrying out development processing, an inorganic pigment pattern and a phosphor pattern corresponding to the resist pattern are formed, and firing processing is carried out, thereby simply and efficiently forming the inorganic pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT |
