发明名称 SUBSTRATE-HOLDING DEVICE, METHOD FOR MANUFACTURING THE SUBSTRATE-HOLDING DEVICE AND METHOD FOR RETAINING SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate-holding device, a method for manufacturing the substrate-holding device and a method for retaining substrate, wherein the substrate can be reinforced and adverse effects on the substrate can be suppressed. <P>SOLUTION: The substrate-holding device 12 is used for reinforcing the strength of a substrate 11, and is fixed to the substrate 11 by a negative pressure. The substrate-holding device 12 has a first holding device 16 and a second holding device 17, which are mutually bonded. The first holding device 16 has a substrate-chucking face 18 serving as a face adhered to the substrate 11, a channel 19 for removing a gas existing between the substrate 11 and the substrate-holding device 12, and a vacuum hole 20. The second holding device 17 has a valve 21, which is bonded to the first holding device 16 to circulate or shut off gas and to retain the substrate 11 by the substrate-holding device 12, and a protrusion which is formed so as to link with the valve 21, for assisting the opening and closing operation of the valve 21. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008078443(A) 申请公布日期 2008.04.03
申请号 JP20060256870 申请日期 2006.09.22
申请人 SEIKO EPSON CORP 发明人 SHIMURA YASUTO
分类号 H01L21/683;B23Q3/08;B24B41/06;B81C99/00 主分类号 H01L21/683
代理机构 代理人
主权项
地址