METHOD FOR MANUFACTURING STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a structure which eliminates the need for removal of a hard mask. SOLUTION: The manufacturing method for a structure containing silicon oxide includes a step for forming a primary layer comprising organic SOG on a substrate and a step for forming a secondary layer comprising inorganic SOG on the primary layer. Thereafter, the primary layer is etched by using a pattern formed on the secondary layer as a mask and then the primary layer and the secondary layer are calcined to manufacture the structure containing silicon oxide. COPYRIGHT: (C)2008,JPO&INPIT