发明名称 VACUUM TREATMENT DEVICE AND AIR OPENING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment device where, even upon the maintenance of a chamber with a low vacuum pressure, it is possible that only the pressure of the chamber with a reduced vacuum pressure shall be returned to the atmospheric pressure. SOLUTION: The vacuum treatment system is provided with: a first vacuum chamber (20) with a prescribed vacuum pressure; a second vacuum chamber (42) with a vacuum pressure lower than that of the first vacuum chamber (20); a gate lock chamber (70) allowing the first vacuum chamber and the second vacuum chamber to be communicated; a first gate valve (GV1) performing opening/closing between the first vacuum chamber and the gate lock chamber; and a second gate valve (gate valve GV2) performing opening/closing between the second vacuum chamber and the gate lock chamber. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008075135(A) 申请公布日期 2008.04.03
申请号 JP20060256237 申请日期 2006.09.21
申请人 NIPPON DEMPA KOGYO CO LTD 发明人 TANZAWA HIROMITSU
分类号 C23C14/56 主分类号 C23C14/56
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