发明名称 |
Projection optical system, exposure apparatus, and exposure method |
摘要 |
A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially uniform over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship.
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申请公布号 |
US2008079924(A1) |
申请公布日期 |
2008.04.03 |
申请号 |
US20070984192 |
申请日期 |
2007.11.14 |
申请人 |
NIKON CORPORATION;CANON KABUSHIKI KAISHA |
发明人 |
KOMATSUDA HIDEKI;TAKAHASHI TOMOWAKI;SUZUKI MASAYUKI |
分类号 |
G03B27/72 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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